CIQTEK has introduced its next-generation 12-inch waferscanning electron microscope (SEM)solution, designed to meet the demands of advanced semiconductor manufacturing processes. Offering full-wafer inspection without the need for rotation or tilting, this innovative solution ensures high-resolution, non-destructive analysis to support critical process development.
Equipped with an ultra-large travel stage (X/Y ≥ 300 mm), the system provides complete coverage of 12-inch wafers, eliminating the need for sample cutting or transfer. This ensures true "original size, original position" observation. With a Schottky field emission electron gun, it achieves a resolution of 1.0 nm at 15 kV and 1.5 nm at 1 kV, minimizing electron beam damage, making it ideal for sensitive materials and structures.
Key features include:
Ultra-large travel stage (X/Y > 300 mm) for full-wafer inspection
High-resolution imaging: 1.0 nm at 15 kV and 1.5 nm at 1 kV
Automated loading and optical navigation system for fast wafer exchange and precise positioning
Intelligent software for auto-focus, astigmatism correction, and multi-format image output
CIQTEK's 12-inch wafer inspection SEM is more than just an observation tool; it's a critical instrument driving higher yields and smaller nodes in semiconductor manufacturing.
September 26–30, Wuhan CIQTEK will unveil eight cutting-edge electron microscopy solutions at the 2025 Chinese National Conference on Electron Microscopy!
Ultra-High Resolution Field Emission Scanning Electron Microscopy (FESEM) The CIQTEK SEM5000X is an ultra-high resolution FESEM with optimized electron optics column design, reducing overall aberrations by 30%, achieving ultra-high resolution of 0.6 nm@15 kV and 1.0 nm@1 kV. Its high resolution and stability make it advantageous in advanced nano-structural materials research, as well as the development and manufacturing of high-technology node semiconductor IC chips.
Ga+ Focused Ion Beam Field Emission Scanning Electron Microscope The CIQTEK DB550 Focused Ion Beam Scanning Electron Microscope (FIB-SEM) has a focused ion beam column for nano-analysis and specimen preparation. It utilizes “super tunnel” electron optics technology, low aberration, and non-magnetic objective design, and has the “low voltage, high resolution” feature to ensure its nanoscale analytical capabilities. The ion columns facilitate a Ga+ liquid metal ion source with highly stable and high-quality ion beams to ensure nanofabrication capabilities. The DB550 is an all-in-one nano-analysis and fabrication workstation with an integrated nano-manipulator, gas injection system, and user-friendly GUI software.
Ultra High-Resolution Tungsten Filament Scanning Electron Microscope The CIQTEK SEM3300 Scanning Electron Microscope (SEM) incorporates technologies such as "Super-Tunnel" electron optics, inlens electron detectors, and electrostatic & electromagnetic compound objective lens. By applying these technologies to the tungsten filament microscope, the long-standing resolution limit of such SEM is surpassed, enabling the tungsten filament SEM to perform low-voltage analysis tasks previously only achievable with field emission SEMs.