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CIQTEK is the manufacturer and global supplier of high-performance scientific instruments, such as Electron Microscopes, Electron Paramagnetic Resonance (Electron Spin Resonance), Gas Adsorption Analyzers, quantum sensors, quantum computers, etc.
SEM Imaging analysis with Focused Ion Beam (FIB)
SEM Imaging analysis with Focused Ion Beam (FIB)

Focused Ion Beam Scanning Electron Microscope | DB500

CIQTEK DB500 is a Field Emission Scanning Electron Microscope with a Focused Ion Beam column for nano analysis and specimen preparation, which is applied with “SuperTunnel” technology, low aberration, and magnetic-free objective lens design, with low-voltage and high-resolution ability that ensures its nano-scale analytical capability. The ion column facilitates a Ga+ liquid metal ion source with a highly stable and high-quality ion beam to ensure nano-fabrication capability.

 

DB500 is equipped with an integrated nano-manipulator, gas injection system, electrical anti-contamination mechanism for the objective lens, and 24 expansion ports, making it an all-around nano-analysis and fabrication platform with comprehensive configurations and expandability.

• “SuperTunnel” Electron Optics technology with a magnetic-free objective lens, suitable for high-resolution imaging, and compatible with magnetic specimen imaging.

The focused ion beam column which outputs a highly stable, high-quality ion beam, suitable for high-quality nano-fabrication and TEM specimen preparation.

A piezoelectrically-driven manipulator located in the specimen chamber with an integrated control system for precise handling.

Independently developed system with strong expandability. The integrated ion source assembly design for quick ion source exchange. Excellent service, supported by an included three-year warranty.

Focused Ion Beam Column

Resolution: 3 nm@30 KV

Probe current (Ion beam current range): 1 pA~50 nA

Accelerating voltage range: 500 V~30 kV

Ion source exchange interval: ≥1000 hours

Stability: 72 hours of uninterrupted operation


Nano-manipulator

Chamber internally mounted

Three-axis all-piezoelectrically driven

Stepper motor accuracy ≤10 nm

Maximum travel speed 2 mm/s

Integrated control


 

 

Ion Beam-Electron Beam Collaboration

 


Gas Injection System

Single GIS design

Various gas precursor sources are available

Needle insertion distance ≥35 mm

Motion repeatability ≤10 μm

Heating temperature control repeatability ≤0.1°C

Heating range: room temperature ~ 90°C

Integrated control

Electron Beam System Electron Gun Type High Brightness Schottky Field Emission Electron Gun
Resolution 1.2 nm@15 kV
Acceleration Voltage 20 V~30 kV
Ion Beam System Ion Source Type Liquid Gallium Ion Source
Resolution 3 nm@30 kV
Acceleration Voltage 500 V ~ 30 kV
Specimen Chamber Vacuum System Fully Automatic Control, Oil-free Vacuum System
Cameras

Three Cameras

(Optical navigation + chamber monitor x2)

Stage Type 5-axis Mechanical Eucentric Specimen Stage
Stage Range

X=110 mm, Y=110 mm, Z=65 mm

T: -10°~+70°, R:360°

Detectors and Extensions Standard

In-lens Detector

Everhart-Thornley Detector (ETD)

Optional

Retractable Back-Scattered Electron Detector (BSED)

Retractable Scanning Transmission Electron Microscopy Detector (STEM)

Energy Dispersive Spectrometer (EDS)

Electron Backscatter Diffraction Pattern (EBSD)

Nano-manipulator

Gas Injection System

Plasma Cleaner

Specimen Exchange Loadlock

Trackball & Knob Control Panel

Software Languages English
Operating System Windows
Navigation Nav-Cam, Gesture Quick Navigation
Automatic Functions Auto Brightness & Contrast, Auto Focus, Auto Stigmator
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